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115-82-2,MFCD00015263
Catalog No.:AA000FHN

115-82-2 | Silicic acid (H4SiO4), tetrakis(2-ethylhexyl) ester

Pack Size
Purity
Availability
Price(USD)
Quantity
  
1g
97%
in stock  
$62.00   $44.00
- +
5g
97%
in stock  
$162.00   $113.00
- +
25g
97%
in stock  
$527.00   $369.00
- +
  • Technical Information
  • Properties
  • Downstream Synthesis Route
  • Literature
  • Request for Quotation
  • Download SDS
  • Technical Information
  • Properties
  • Downstream Synthesis Route
  • Literature
Technical Information
Catalog Number:
AA000FHN
Chemical Name:
Silicic acid (H4SiO4), tetrakis(2-ethylhexyl) ester
CAS Number:
115-82-2
Molecular Formula:
C32H68O4Si
Molecular Weight:
544.9654
MDL Number:
MFCD00015263
SMILES:
CCCCC(CO[Si](OCC(CCCC)CC)(OCC(CCCC)CC)OCC(CCCC)CC)CC
NSC Number:
6136
Properties
Computed Properties
 
Complexity:
390  
Covalently-Bonded Unit Count:
1  
Heavy Atom Count:
37  
Hydrogen Bond Acceptor Count:
4  
Rotatable Bond Count:
28  
Undefined Atom Stereocenter Count:
4  

Downstream Synthesis Route

[1]CurrentPatentAssignee:EVONIKINDUSTRIESAG-US2017/210763,2017,A1Locationinpatent:Paragraph0049;0050

[2]CurrentPatentAssignee:CHEVRONCORP-US2643263,1953,A

Literature

Title: Observation of a liquid-to-layered transition in thin liquid films when surface and interface regions overlap.

Journal: Physical review. E, Statistical, nonlinear, and soft matter physics 20080301

Title: Comparing the activation energy of diffusion in bulk and ultrathin fluid films.

Journal: The Journal of chemical physics 20071107

Title: Combined atomic force microscopy and fluorescence correlation spectroscopy measurements to study the dynamical structure of interfacial fluids.

Journal: Langmuir : the ACS journal of surfaces and colloids 20070424

Title: Observation of surface layering in a nonmetallic liquid.

Journal: Physical review letters 20060310

Title: A modified surface forces apparatus for single molecule tracking.

Journal: The journal of physical chemistry. B 20060309

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SDS
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Tags:115-82-2 Molecular Formula|115-82-2 MDL|115-82-2 SMILES|115-82-2 Silicic acid (H4SiO4), tetrakis(2-ethylhexyl) ester