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[1]CurrentPatentAssignee:KWANSEIGAKUINUNIVERSITY;CHISSOCORPORATION-JP2021/80190,2021,ALocationinpatent:Paragraph0376-0380
[2]Hirai,Hiroki;Nakajima,Kiichi;Nakatsuka,Soichiro;Shiren,Kazushi;Ni,Jingping;Nomura,Shintaro;Ikuta,Toshiaki;Hatakeyama,Takuji[AngewandteChemie-InternationalEdition,2015,vol.54,#46,p.13581-13585][Angew.Chem.,2015,p.13785-13789,5]
[3]CurrentPatentAssignee:KWANSEIGAKUINUNIVERSITY;SKINC-CN105431439,2016,ALocationinpatent:Paragraph0891;0892;0893
[4]CurrentPatentAssignee:UNIVERSALDISPLAYCORP-CN112707923,2021,ALocationinpatent:Paragraph0348-0349
[5]CurrentPatentAssignee:UNIVERSALDISPLAYCORP-US2021/122765,2021,A1Locationinpatent:Paragraph0184
[1]Hirai,Hiroki;Nakajima,Kiichi;Nakatsuka,Soichiro;Shiren,Kazushi;Ni,Jingping;Nomura,Shintaro;Ikuta,Toshiaki;Hatakeyama,Takuji[AngewandteChemie-InternationalEdition,2015,vol.54,#46,p.13581-13585][Angew.Chem.,2015,p.13785-13789,5]
[1]Hirai,Hiroki;Nakajima,Kiichi;Nakatsuka,Soichiro;Shiren,Kazushi;Ni,Jingping;Nomura,Shintaro;Ikuta,Toshiaki;Hatakeyama,Takuji[AngewandteChemie-InternationalEdition,2015,vol.54,#46,p.13581-13585][Angew.Chem.,2015,p.13785-13789,5]
[2]CurrentPatentAssignee:KWANSEIGAKUINUNIVERSITY;SKINC-CN105431439,2016,ALocationinpatent:Paragraph0894;0895;0896
[1]CurrentPatentAssignee:KWANSEIGAKUINUNIVERSITY;SKINC-CN105431439,2016,ALocationinpatent:Paragraph1049;1050;1051